Ultra-deep x-ray lithography of densely packed SU-8 features: II. Process performance as a function of dose, feature height and post exposure bake temperature

Journal of Micromechanics and Microengineering

Volumn 15, Issue 6, 2005, Pages 1249-1259

  Becnel, Charles ^a   Desta, Yohannes ^b   Kelly, Kevin ^c  

^a International Mezzo Technologies Inc   (United States)

^b LOUISIANA STATE UNIVERSITY   (United States)

^c Louisiana State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CROSSLINKING; DIFFUSION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT TRANSFER; MASS TRANSFER; POLYMETHYL METHACRYLATES; X RAY LITHOGRAPHY;

BAKE TEMPERATURE; HIGH ASPECT RATIO MICROSTRUCTURES (HARM); SOLVENT CONTENT; ULTRA-DEEP X-RAY LITHOGRAPHY;

PHOTORESISTS;

CROSS LINKING; DIFFUSION; FOURIER ANALYSIS; HEAT TRANSFER; INFRARED SPECTRA; LITHOGRAPHY; MASS TRANSFER; X RAYS;

EID: 18744371856     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/6/016     Document Type: Article

References (16)

1. Stephens L S, Kelly K W, Kountouris D and McClean J 2001 A micro heat sink for cooling macro-scale conformal surfaces under the influence of thrust and frictional forces J. Microelectromech. Syst. 10 222-31
2. Harris C, Kelly K, Wang T, McCandless A and Motakef S 2002 Fabrication, modeling and testing of micro cross flow heat exchangers J. Microelectromech. Syst. 11 726-35
3. Harris C, Kelly K W and Despa M 2000 Design and fabrication of a cross flow micro heat exchanger J. Microelectromech. Syst. 9 502-8
4. Turner R, Desta Y, Kelly K, Zhang J, Geiger E, Cortez S and Mancini D 2003 Tapered LIGA HARMs J. Micromech. Microeng. 13 367-72
5. Cremers C, Bouamrane F, Singleton L and Schenk R 2001 SU-8 as resist material for deep x-ray lithograhy Microsyst. Technol. 7 11-6
6. Bogdanov A L and Peredov S S 2000 Use of SU-8 photoresist for very high aspect ratio x-ray lithography Microelectron. Eng. 53 493-6
7. Khan Malek C G 2002 SU-8 resist for low-cost x-ray patterning of high-resolution, high-aspect-ratio MEMS Microelectron. J. 33 101-5
8. Schneider A, Su B, Button T, Singleton L, Wilhelmi O, Huq S, Prewett P and Lawes R 2002 Comparison of PMMA and SU-8 resist moulds for embossing of PZT to produce high-aspect-ratio microstructures using LIGA process Microsyst. Technol. 8 88-92
9. Jian L et al 2003 SU-8 based deep x-ray lithography/LIGA Proc. SPIE 4979 394-401
10. Jian L, Desta Y and Goettert J 2001 Multi-level microstructures and mold inserts fabricated with planar and oblique lithography of SU-8 negative photoresist Proc. SPIE 4557 69-76
11. Jian L, Loechel B, Scheunemann H, Bednarzik M, Desta Y and Goettert J 2003 Fabrication of ultra thick, ultra high aspect ratio microcomponents by deep and ultra deep x-ray lithography Int. Conf. on MEMO, NANO and Smart Systems (Canada, July 2003)
12. Becnel C, Desta Y and Kelly K 2005 Ultra-deep x-ray lithography of densely packed SU-8 features: I. An SU-8 casting procedure to obtain uniform solvent content with accompanying experimental results J. Micromech. Microeng. 15 1242-8
13. Meyer P, Cremers C, El-Kholi A, Haller D, Schulz J, Hahn L and Megtert S 2002 A MS-Windows simulation tool for synchrotron x-ray exposure and subsequent development Microsyst. Technol. 9 104-8
14. Incropera F and DeWitt D 2002 Fundamentals of Heat and Mass Transfer 5th edn (New York: Wiley) p 257
15. Stewart M, Tran H, Schmid G, Stachowiak T, Becker D and Willson C 2002 Acid catalyst mobility in resist resins J. Vac. Sci. Technol. B 20 2946-52
16. Shew B, Huang T, Liu K and Chou C 2004 Oxygen quenching effect in ultra-deep x-ray lithography with SU-8 resist J. Micromech. Microeng. 14 410-4