Fabrication of ultra thick, ultra high aspect ratio microcomponents by deep and ultra deep X-ray lithography

Proceedings - International Conference on MEMS, NANO and Smart Systems, ICMENS 2003

Volumn , Issue , 2003, Pages 10-14

  Jian, L ^a   Loechel, B ^a   Scheunemann, H U ^a   Bednarzik, M ^a   Desta, Y M ^b   Goettert, J ^b  

^a HAHN MEITNER INSTITUT   (Germany)

^b LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

Etching; Implantable biomedical devices; Microfluidics; Micromechanical devices; Microstructure; Optical device fabrication; Prototypes; Resists; Road transportation; X ray lithography

Indexed keywords

ASPECT RATIO; ETCHING; FABRICATION; LITHOGRAPHY; MICROFLUIDICS; MICROSTRUCTURE; X RAY OPTICS;

IMPLANTABLE BIOMEDICAL DEVICES; MICROMECHANICAL DEVICE; OPTICAL DEVICE FABRICATION; PROTOTYPES; RESISTS; ROAD TRANSPORTATION;

X RAY LITHOGRAPHY;

EID: 84941007195     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICMENS.2003.1221957     Document Type: Conference Paper

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