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Volumn 4557, Issue , 2001, Pages 69-76

Multi-level microstructures and mold inserts fabricated with planar and oblique x-ray lithography of SU-8 negative photoresist

Author keywords

LIGA; Mold insert; Multi level microstructure; PDMS; SU 8; X ray lithography

Indexed keywords

ELECTROPLATING; INJECTION MOLDING; MICROSTRUCTURE; RAPID PROTOTYPING; X RAY LITHOGRAPHY;

EID: 0035765701     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.442979     Document Type: Conference Paper
Times cited : (10)

References (13)
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  • 4
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    • H. Lorenz, M. Despont, N. Fahrni, J. Brugger, P. Renaud, and P. Vettiger, "High-aspect-ratio, ultra-thick, negative-tone near-UV photoresist and its applications for MEMS," Sensors and Actuators A 64, pp. 33-39, 1995.
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    • Lorenz, H.1    Despont, M.2    Fahrni, N.3    Brugger, J.4    Renaud, P.5    Vettiger, P.6
  • 5
    • 0033724050 scopus 로고    scopus 로고
    • Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters
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    • Mask prototyping for ultra-deep X-ray lithography: Preliminary studies for mask blanks and high-aspect-ratio absorber pattern
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    • (1998) Proc. SPIE , vol.3512 , pp. 227
    • Malek, C.K.1
  • 10
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.