A MS-Windows simulation tool for synchrotron X-ray exposure and subsequent development

Microsystem Technologies

Volumn 9, Issue 1-2, 2003, Pages 104-108

  Meyer, P ^a   Cremers, C ^b   El Kholi, A ^a   Haller, D ^a   Schulz, J ^a   Hahn, L ^a   Megtert, S ^b  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; C (PROGRAMMING LANGUAGE); COMPUTER SIMULATION; DATABASE SYSTEMS; GRAPHICAL USER INTERFACES; LITHOGRAPHY; MATHEMATICAL MODELS; MICROSTRUCTURE; OPTICAL DEVICES; PERSONAL COMPUTERS; POLYMETHYL METHACRYLATES; X RAYS;

COMPUTER SOFTWARE - MS-WINDOWS; DEBYE-WALLER COEFFICIENT; LIGA TECHNOLOGY; X-RAY LITHOGRAPHY;

COMPUTER OPERATING SYSTEMS;

EID: 17444377955     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-002-0209-3     Document Type: Review

References (9)

1. Sanchez del Rio M; Dejus RJ (1997) XOP: A multiplatform graphical user interface for synchrotron radiation spectral and optics calculations. SPIE Proceedings 3152: 148-157
2. Winick H (1980) Synchrotron radiation research. In: Properties of Synchrotron Radiation. Chapter 2 Plenium Press, New York
3. Margaritondo G (1988) Introduction to synchrotron radiation. In: Bending Magnet Radiation. Chapter 2.2 Oxford University Press, New York, Oxford
4. Maid B; Ehrfeld W; Hormes J; Mohr J; Münchmeyer (1989) D Anpassung der spektralen Verteilung der Synchrotronstrahlung f̈r die Röntgentiefenlithografie. PhD No KfK4579 (Karlsruhe)
5. Salomon EB; Hubbell JH; Scofield JH (1988) X-Ray attenuation cross sections for energies 100 eV to 100 keV and Elements Z = 1 to Z = 92. Atomic Data and Nuclear Data Tables 38:1-197
6. Veigele WMJ (1973) Photon cross sections from 0.1 keV to 1 MeV for elements Z = 1 to Z = 94. Atomic Data 5: 51-111
7. Henke BL; Lee P; Tanaka TJ; Shimabukuro RL; Fujikawa BK (1993) Low energy X-ray interaction coefficients, photoab-sorption, scattering transmission and reflection. Atomic Data and Nuclear Data Tables 54: 181-342
8. Meyer P; El-Kholi A; Mohr J; Cremers C; Bouamrane F; Megtert S (1999) Study of the development behaviour of irradiated foils and microstructure. Proceedings of SPIE (Micromachining and Microfabrication Process Technology V) 3874: 312-320
9. Pérennès F; Pantenburg FJ (2001) Adhesion improvement in the deep X-ray lithography process using a central beam stop. Nucl Inst Meth B 174/3: 317-323