The promise of diffractive optics in maskless lithography

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 35-41

  Gil, Dario ^a   Menon, Rajesh ^a,b   Smith, Henry I ^a  

^a USA   (United States)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Blazed zone plate; Diffractive optics; Maskless lithography

Indexed keywords

COHERENT LIGHT; COSTS; IMAGE QUALITY; IMAGING TECHNIQUES; MATHEMATICAL MODELS; PATTERN RECOGNITION; PHOTOLITHOGRAPHY; PHOTONS; SCANNING; SILICON WAFERS; ULTRAVIOLET RADIATION; WAVEFRONTS;

BLAZED ZONE PLATE; MASKLESS LITHOGRAPHY; MICROMECHANICAL ARRAYS; RESOLUTION ENHANCEMENT TECHNIQUES (RET);

DIFFRACTIVE OPTICS;

EID: 18544396634     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00069-3     Document Type: Conference Paper

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