Bias voltage dependence properties of DC reactive magnetron sputtered indium oxide films

Journal of Optoelectronics and Advanced Materials

Volumn 6, Issue 1, 2004, Pages 205-210

  Babu, P Mohan ^a   Radhakrishna, B ^b   Rao, G Venkata ^a   Reddy, P Sreedhara ^a   Uthanna, S ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b Department of Physics   (India)

Author keywords

Electrical and optical properties; Indium oxide films; Magnetron sputtering; Structure

Indexed keywords

CRYSTAL ORIENTATION; ELECTRIC CONDUCTIVITY; GLASS; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING FILMS; SEMICONDUCTING INDIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

BIAS VOLTAGE; INDIUM OXIDE FILMS;

INTELLIGENT MATERIALS;

EID: 1842631745     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (33)

1. J. I. Jeong, J. H. Moon, J. H. Hong, J. S. Kang, Y. Fukuda, Y. P. Lee, J. Vac. Sci. Technol. A14, 293 (1996).
2. H. J. Glasser, Glass Technol. Ber. 50, 1912 (1977).
3. J. C. C. Fan, F. J. Bachner, J. Electrochem. Soc. 12, 1719 (1975).
4. T. Nagamoto, O. Omoto, Jpn. J. Appl. Phys. 14, 915 (1976).
5. T. A. Gessert, X. Li, M. W. Wanless, A. J. Nelson, T. J. Couts, J. Vac. Sci. Technol., A6, 1912 (1990).
6. S. Naseem, M. Iqbal, K. Hussain, Solar Energy Mater. Solar Cells 31, 155 (1993).
7. E. Baba Ali, H. El Maliki, J. C. Bernede, M. Sahnoun, A. Khelil, O. Saadene, Mater. Chem. Phys. 73, 78 (2002).
8. S. Nakamura, Jpn. J. Appl. Phys., 30, L 2062 (1991).
9. V. Damodara Das, S. Kirupavathy, L. Damodara, N. Lakshminarayana, J. Appl. Phys. 79, 8521 (1996).
10. Y. Yamada, N. Suzuki, T. Makino, T. Yoshida, J. Vac. Sci. Technol. A18, 83 (2000).
11. F. O. Adurodija, H. Izumi, T. Ishihara, H. Yoshioka, H. Matsui, M. Motoyama, Appl. Phys. Lett. 74, 3059 (1999).
12. F. O. Adurodija, H. Izumi, T. Ishihara, H. Yoshioka, J. Vac. Sci. Technol. A18, 814 (2000).
13. T. Aikainen, M. Ritala, W. M. Li, R. Lappalainen, M. Leskele, Appl. Surf. Sci. 112, 231 (1997).
14. A. Gurto, M. Ivanovskaya, A. Pfau, U. Weimer, W. Gopel, Thin Solid Films 307, 288 (1997).
15. H. Imai, A. Tominaga, H.Hirashima, M. Toki and N. Asakuma. J.Appl. Phys. 85, 203(1999).
16. J. S. Cho, K. H. Yoon, S. K. Koh, J. Appl. Phys. 89, 3223 (2001).
17. A. H. M. Zahirul, P. K. Saha, T. Hata, K. Sasaki, Thin Solid Films 352, 133 (1999).
18. G. Golan, A. Axelevitch, E. Rabinovitch, J. Vac. Sci. Technol. A16, 2614 (1998).
19. T. Minami, J. Vac. Sci. Technol. A17, 1765 (1999).
20. B. Radhakrishna, T. K. Subramanyam, B. S. Naidu, S. Uthanna, Optical Mater. 15, 217 (2000).
21. M. Bender, N. Katsarakis, E. Gagaoudakis, E. Hourdekis, E. Douloufakis, V. Cimalla, G. Kiriakidis, J. Appl. Phys. 90, 5382 (2001).
22. B. Radhakrishna, T. K. Subramanyam, B. S. Naidu, S. Uthanna, Indian J. Phys. 75A, 457 (2001).
23. M. Mizuhashi, Thin Solid Films 76, 97 (1981).
24. J. L. van der Pauw, Phillips Res. Rep. 13, 1 (1958).
25. J. H. Haung, C. H. Lin, C. H. Ma, H. Chen, Ser. Mater. 42, 573 (2000).
26. B. D. Cullity, Elements of X-ray diffraction, Addison-Wesley, London (1978).
27. Z. W. Yang, S. H. Han, T. L. Yang, L. Ye, D. H. Zhang, H. L. Ma, C. F. Cheng, Thin Solid Films 366, 4 (2000).
28. Ch. Sujatha, G. Mohan Rao, S. Uthanna, Mater. Sci. Engg. B 94, 106 (2002).
29. P. Nath, R. F. Bunshah, Thin Solid Films 69, 63 (1980).
30. K. T. Ramakrishna Reddy, C. Sravani, R. W. Miles, J. Cryst. Growth 184-185, 1031 (1998).
31. V. Teixeira, H. N. Cui, L. J. Meng, E. Fortunato, R. Martins, Thin Solid Films 420, 70 (2002).
32. S. Honda, K. Chihara, M. Watamori, K. Oura, Appl. Surf. Sci. 113-114, 406 (1997).
33. G. Haacke, J. Appl. Phys. 47, 4086 (1976).