High-rate reactive deposition of indium oxide films on unheated substrate using ozone gas

Thin Solid Films

Volumn 352, Issue 1-2, 1999, Pages 133-137

  Zahirul Alam, A H M ^a   Saha, P K ^a   Hata, T ^b   Sasaki, K ^b  

^a BANGLADESH UNIVERSITY OF ENGINEERING AND TECHNOLOGY   (Bangladesh)

^b KANAZAWA UNIVERSITY   (Japan)

Author keywords

Metallic mode; Reactive sputtering

Indexed keywords

EID: 0000774107     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00347-8     Document Type: Article

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