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Volumn 352, Issue 1-2, 1999, Pages 133-137

High-rate reactive deposition of indium oxide films on unheated substrate using ozone gas

Author keywords

Metallic mode; Reactive sputtering

Indexed keywords


EID: 0000774107     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00347-8     Document Type: Article
Times cited : (15)

References (14)
  • 9
    • 0347885897 scopus 로고    scopus 로고
    • U.S. Patents 442,811 and 442,812 (1984)
    • W.D. Sproul, U.S. Patents 442,811 and 442,812 (1984).
    • Sproul, W.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.