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Volumn 352, Issue 1-2, 1999, Pages 133-137
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High-rate reactive deposition of indium oxide films on unheated substrate using ozone gas
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Author keywords
Metallic mode; Reactive sputtering
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Indexed keywords
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EID: 0000774107
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(99)00347-8 Document Type: Article |
Times cited : (15)
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References (14)
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