Transparent and conductive multicomponent oxide films prepared by magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1765-1772

  Minami, Tadatsugu ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BAND GAP ENERGY; CHEMICAL COMPOSITIONS; DC MAGNETRON SPUTTERING; FILM MATERIALS; INDIUM TIN OXIDE; METAL OXIDES; MIXTURE RATIO; MULTI-COMPONENT OXIDES; TERNARY COMPOUNDS; TRANSPARENT CONDUCTING OXIDE FILMS; TRANSPARENT CONDUCTORS; ZNO;

CHEMICAL COMPOUNDS; CHEMICAL PROPERTIES; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; FILM PREPARATION; GALLIUM; TERNARY ALLOYS; TERNARY SYSTEMS; TIN; ZINC; ZINC OXIDE;

OXIDE FILMS;

EID: 73349095875     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581888     Document Type: Conference Paper

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