Stoichiometric indium oxide thin films prepared by pulsed laser deposition in pure inert background gas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 1, 2000, Pages 83-86

  Yoshida, Takehito ^a  

^a Matsushita Research Institute Tokyo Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; DEPOSITION; FILM PREPARATION; HEATING; HIGH PRESSURE EFFECTS; INERT GASES; OXIDATION; PULSED LASER APPLICATIONS; STOICHIOMETRY; THIN FILMS;

INDIUM OXIDE THIN FILMS; PULSED LASER DEPOSITION; SUBSTRATE HEATING;

INDIUM COMPOUNDS;

EID: 0033707504     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582122     Document Type: Article

References (2)

1. J. L. Vossen, Phys. Thin Films 9, 1 (1977).
2. K. L. Chopra, S. Major, and D. K. Pandya, Thin Solid Films 102, 1 (1983).