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Volumn 555, Issue 1-3, 2004, Pages 193-208
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Secondary ion formation/survival during the initial stages of sputtering Si and SiO2 with Cs+
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Author keywords
Ion solid interactions; Secondary ion mass spectrometry; Surface electrical transport (surface conductivity, surface recombination, etc.); Work function measurements
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Indexed keywords
AUGER ELECTRON SPECTROSCOPY;
CESIUM;
CHARGE TRANSFER;
ELECTRIC CONDUCTIVITY;
ELECTRON TRANSPORT PROPERTIES;
SILICA;
SPUTTERING;
SURFACE PROPERTIES;
ION-SOLID INTERACTIONS;
SURFACE ELECTRICAL TRANSPORT;
WORK FUNCTION MEASUREMENTS;
SECONDARY ION MASS SPECTROMETRY;
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EID: 1842527431
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/j.susc.2004.02.032 Document Type: Article |
Times cited : (13)
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References (42)
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