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Volumn 555, Issue 1-3, 2004, Pages 193-208

Secondary ion formation/survival during the initial stages of sputtering Si and SiO2 with Cs+

Author keywords

Ion solid interactions; Secondary ion mass spectrometry; Surface electrical transport (surface conductivity, surface recombination, etc.); Work function measurements

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CESIUM; CHARGE TRANSFER; ELECTRIC CONDUCTIVITY; ELECTRON TRANSPORT PROPERTIES; SILICA; SPUTTERING; SURFACE PROPERTIES;

EID: 1842527431     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.02.032     Document Type: Article
Times cited : (13)

References (42)
  • 1
    • 0003852569 scopus 로고
    • Fundamental Processes of Atomic Dynamics
    • J.S. Briggs, H. Kleinpoppen, & H.O. Lutz.
    • Andra H.J. Briggs J.S., Kleinpoppen H., Lutz H.O. Fundamental Processes of Atomic Dynamics. NATO ASI Series B. 1988;181.
    • (1988) NATO ASI Series B , pp. 181
    • Andra, H.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.