Ionization probability of sputtered cluster anions: C n - and Si n -

Applied Surface Science

Volumn 203-204, Issue , 2003, Pages 78-81

  Gnaser, Hubert ^a  

^a Rheinland Pfälzische Technische Universität Kaiserslautern Landau   (Germany)

Author keywords

Anions; Cluster; Cs incorporation; Ionization probability; Sputtering; Work function

Indexed keywords

EMISSION SPECTROSCOPY; IN SITU PROCESSING; IONIZATION; NEGATIVE IONS; PROBABILITY; SILICON; SPUTTERING;

SPUTTERED IONS;

CARBON;

EID: 0037438251     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00683-9     Document Type: Conference Paper

References (12)

1. Urbassek H.M., Hofer W.O., Dan K. Vidensk. Selsk. Mat. Fys. Medd. 43:1993;97.
2. H. Gnaser, Low-Energy Ion Irradiation of Solid Surfaces, Springer, Berlin, 1999.
3. Krohn V.E. J. Appl. Phys. 33:1962;3523.
4. Williams P., Lewis R.K., Evans C.A., Hanley P.R. Anal. Chem. 49:1977;1399.
5. M.L. Yu, in: R. Behrisch, K. Wittmaack (Eds.), Sputtering by Particle Bombardment, Vol. III, Springer, Berlin, 1991, p. 91.
6. Gnaser H. Phys. Rev. B. 54:1996;16456.
7. Lang N.D. Phys. Rev. B. 27:1983;2019.
8. Gnaser H. Phys. Rev. B. 63:2001;045415.
9. Gnaser H. Nucl. Instrum. Meth. B. 149:1999;38.
10. Gnaser H. Nucl. Instrum. Meth. B. 164/165:2000;705.
11. Yang S.et al. Chem. Phys. Lett. 144:1988;431.
12. Cheshnovsky O.et al. Chem. Phys. Lett. 138:1987;119.