Simulation of electron trajectories of wien filter for high-resolution EELS installed in TEM

Journal of Electron Microscopy

Volumn 45, Issue 5, 1996, Pages 417-427

  Tsuno, Katsushige ^a   Rouse, John ^b  

^a JEOL LTD   (Japan)

^b Munro's Electron Beam Software Ltd   (United Kingdom)

Author keywords

Aberration; EELS; Electron trajectory; Field calculation; Wien filter

Indexed keywords

BANDPASS FILTERS; ELECTRIC FIELDS; SILICON COMPOUNDS;

% REDUCTIONS; CONDITION; ELECTRIC AND MAGNETIC FIELDS; ELECTRIC FIELD DISTRIBUTIONS; ELECTRON TRAJECTORIES; FIELD CALCULATION; HIGH-RESOLUTION EELS; MAGNETIC FIELD DISTRIBUTION; POWER SUPPLY; WIEN FILTERS;

TRAJECTORIES;

EID: 0011598799     PISSN: 00220744     EISSN: None     Source Type: Journal    
DOI: 10.1093/oxfordjournals.jmicro.a023460     Document Type: Article

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