Low-loss silica-based optical film waveguides deposited by helicon-activated reactive evaporation

Journal of Lightwave Technology

Volumn 23, Issue 3, 2005, Pages 1302-1307

  Bulla, Douglas A P ^a   Li, Wei Tang ^a   Charles, Christine ^a   Boswell, Rod ^a   Ankiewicz, Adrian ^a   Love, John D ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

Dielectric waveguides; Optical planar waveguides and optical losses; Plasma CVD

Indexed keywords

BIREFRINGENCE; ETCHING; HYDROFLUORIC ACID; LIGHT POLARIZATION; LIGHT PROPAGATION; LIGHT TRANSMISSION; NUMERICAL ANALYSIS; OPTICAL FILMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICA; SILICON WAFERS;

HELICON ACTIVATED REACTIVE EVAPORATION; OPTICAL LOSSES; OPTICAL PLANAR WAVEGUIDES;

OPTICAL WAVEGUIDES;

EID: 18144370064     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/JLT.2005.843482     Document Type: Article

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