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Volumn 80, Issue 8, 1996, Pages 4707-4714

Effect of ion energy on the optical and structural properties of SiO2 grown by plasma-enhanced chemical-vapor deposition

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Indexed keywords


EID: 0011479685     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363428     Document Type: Article
Times cited : (17)

References (26)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.