Influence of hydrogen on SiO2 thick film deposited by PECVD and FHD for silica optical waveguide

Crystal Research and Technology

Volumn 37, Issue 12, 2002, Pages 1257-1263

  Kim, Y T ^a   Cho, S M ^a   Seo, Y G ^b   Yoon, H D ^b   Im, Y M ^b   Yoon, D H ^a  

^a Sungkyunkwan University   (South Korea)

^b Korea Electronic Technology Institute (KETI)   (South Korea)

Author keywords

Annealing; Flame hydrolysis deposition; Plasma enhanced chemical vapor deposition; Silicon dioxide

Indexed keywords

ANNEALING; HYDROGEN; HYDROLYSIS; OPTICAL WAVEGUIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROUS MATERIALS; REFRACTIVE INDEX; SILICA; THERMAL EFFECTS;

FLAME HYDROLYSIS DEPOSITION (FHD);

THICK FILMS;

EID: 0036954794     PISSN: 02321300     EISSN: None     Source Type: Journal    
DOI: 10.1002/crat.200290000     Document Type: Article

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