Silica buried channel waveguides fabricated at low temperature using PECVD

Electronics Letters

Volumn 32, Issue 4, 1996, Pages 326-327

  Durandet, A ^a   Perry, A ^a   Boswell, R ^a   Ladouceur, F ^a   Love, J ^a   Faith, M ^b   Kemeny, P ^b   Ma, X ^c   Austin, M ^c  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b Telecom Research Laboratories   (Australia)

^c RMIT UNIVERSITY   (Australia)

Author keywords

Optical waveguides; Plasma deposition

Indexed keywords

BURIED CHANNEL WAVEGUIDES; ION ENERGY; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA REACTORS; PRISM COUPLER; THERMAL CONTACT;

CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); FLUORINE; HELIUM; LOW TEMPERATURE OPERATIONS; METHANE; OPTICAL FIBERS; OXYGEN; REFRACTIVE INDEX; SILICA; SILICON WAFERS; X RAY ANALYSIS;

OPTICAL WAVEGUIDES;

EID: 0030085507     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19960254     Document Type: Article

References (10)

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9. 2', to be published
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