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Volumn 11, Issue 3, 2001, Pages
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Selective area deposition of titanium dioxide thin films by light induced chemical vapour deposition
a
a
EPFL
(Switzerland)
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
COMPUTER SIMULATION;
EXCIMER LASERS;
IRRADIATION;
LENSES;
MASKS;
OPTICAL MICROSCOPY;
OPTICAL RESOLVING POWER;
PROFILOMETRY;
TITANIUM DIOXIDE;
STYLUS PROFILOMETRY;
TITANIUM TETRAISOPROPOXIDE;
THIN FILMS;
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EID: 0034848687
PISSN: 11554339
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1051/jp4:20013104 Document Type: Conference Paper |
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Times cited : (5)
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References (15)
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