Growth and morphological stability of nickel germano-silicide on strained Si1-xGex (X=0 to 0.25) under rapid thermal annealing

Proceedings - Electrochemical Society

Volumn 7, Issue , 2004, Pages 1095-1106

  Carron, V ^a   Hartmann, J M ^a   Farjot, T ^a   Holliger, P ^a   Laugier, F ^a   Rolland, G ^a  

^a CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; HOLE MOBILITY; MORPHOLOGY; SILICON; STRAIN; THERMAL EFFECTS; THICKNESS MEASUREMENT; X RAY DIFFRACTION;

COMPRESSIVE STRAIN; MORPHOLOGICAL STABILITY; SILICIDE; THERMAL ANNEALING;

NICKEL;

EID: 17044410938     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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