Integration of Carbon Nanotubes Devices into Microelectronics

Materials Research Society Symposium - Proceedings

Volumn 772, Issue , 2003, Pages 3-15

  Hoenlein, W ^a   Kreupl, F ^a   Duesberg, G S ^a   Graham, A P ^a   Liebau, M ^a   Seidel, R ^a   Unger, E ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYST SELECTIVITY; CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; ELECTROMIGRATION; HIGH TEMPERATURE EFFECTS; LASER ABLATION; MICROELECTRONICS; MOSFET DEVICES; SEMICONDUCTOR GROWTH; SILICON WAFERS; TRANSCONDUCTANCE;

CONTACT RESISTANCE;

CARBON NANOTUBES;

EID: 1642541148     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-772-m4.5     Document Type: Conference Paper

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