Near-diffraction limited coherent X-ray focusing using planar refractive lenses made of epoxy SU-8 resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5539, Issue , 2004, Pages 20-30

  Snigireva, I ^a   Snigirev, A ^a   Drakopoulos, M ^b   Kohn, V ^c   Nazmov, V ^d,e   Reznikova, E ^d   Mohr, J ^d   Saile, V ^d,e  

^a EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^b DIAMOND LIGHT SOURCE LTD   (United Kingdom)

^c KURCHATOV INSTITUTE   (Russian Federation)

^d KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^e UNIVERSITY OF KARLSRUHE   (Germany)

Author keywords

Deep lithography; Imaging; Planar refractive lenses; X ray focusing

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; EPOXY RESINS; FABRICATION; FOCUSING; LASER BEAMS; MONOCHROMATORS; OPTICAL DEVICES; OPTICAL MICROSCOPY; PHOTORESISTS; X RAYS;

DEEP LITHOGRAPHY; MICROFABRICATION TECHNIQUES; PLANAR REFRACTIVE LENSES; X-RAY FOCUSING;

LENSES;

EID: 15844415289     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.561082     Document Type: Conference Paper

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