X-ray standing wave microscopy: Chemical microanalysis with atomic resolution

Applied Physics Letters

Volumn 81, Issue 12, 2002, Pages 2279-2281

  Drakopoulos, Michael ^a   Zegenhagen, Jörg ^a   Snigirev, Anatoly ^a   Snigireva, Irina ^a   Hauser, Maik ^b   Eberl, Karl ^b   Aristov, Vitalii ^c   Shabelnikov, Leonid ^c   Yunkin, Vecheslav ^c  

^a EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^b MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

^c INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC RESOLUTION; CHEMICAL SENSITIVITY; CROSS SECTION; CRYSTALLINE GRAINS; EPITAXIALLY GROWN; GAAS; MICRO-PROBES; MICROSCOPIC SCALE; MICROSCOPY TECHNIQUE; REFRACTIVE LENS; X RAY BEAM; X-RAY STANDING WAVE METHOD; X-RAY STANDING WAVES;

CHEMICAL ANALYSIS; ELASTIC WAVES; MICROSCOPIC EXAMINATION; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DEVICES; WAVES; X RAY ANALYSIS; X RAYS;

STANDING WAVE METERS;

EID: 79956015970     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1506779     Document Type: Article

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