Generation mechanism of surface roughness in resists - Free volume effect on surface roughness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 921-928

  Yamaguchi, Toru ^a   Namatsu, Hideo ^a  

^a NTT Basic Research Laboratories   (Japan)

Author keywords

Aggregate extraction development; Line edge roughness; Positive tone resist; Surface roughness

Indexed keywords

ELECTRON BEAMS; MOLECULAR WEIGHT; POLYMERS; SURFACE ROUGHNESS; SURFACES;

POLYMER AGGREGATES;

PHOTORESISTS;

EID: 0036031354     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474165     Document Type: Conference Paper

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