Effect of the growth temperature on ZnO thin films grown by plasma enhanced chemical vapor deposition

Thin Solid Films

Volumn 414, Issue 2, 2002, Pages 170-174

  Li, B S ^a,b   Liu, Y C ^a,b   Zhi, Z Z ^a,b   Shen, D Z ^a,b   Lu, Y M ^a,b   Zhang, J Y ^a,b   Kong, X G ^a,b   Fan, X W ^a,b  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^b CHANGCHUN INSTITUTE OF OPTICS   (China)

Author keywords

Luminescence; Organometallic vapor deposition; Plasma processing and deposition; Zinc oxide

Indexed keywords

ABSORPTION; CRYSTAL ORIENTATION; EXCITONS; FILM GROWTH; ORGANOMETALLICS; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; STOICHIOMETRY; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

ORGANOMETALLIC VAPOR DEPOSITION;

THIN FILMS;

EID: 0037158405     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00491-1     Document Type: Article

References (27)