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Volumn 262, Issue 1-4, 2004, Pages 72-77

Effect of thermal annealing on the surface and the microstructural properties of ZnO thin films grown on p-Si (1 0 0) substrates

(7) Kim, T W a Lee, K H b Lee, H S b Lee, J Y b Kang, S G a Kim, D W c Cho, W J c

a Hanyang University (South Korea)

b Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

c Korea Institute of Science and Technology (South Korea)

Author keywords

A1. Transmission electron microscopy; A3. Radio frequency magnetron sputtering; B1. ZnO

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CRYSTALLIZATION; MAGNETRON SPUTTERING; RAPID THERMAL ANNEALING; SILICON; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

CHEMICAL STABILITY; CRYSTAL DIRECTION; RADIO FREQUENCY MAGNETRON SPUTTERING;

FILM GROWTH;

EID: 0842265198 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2003.10.076 Document Type: Article

Times cited : (12)

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