Wet-chemical treatment of Si3N4 surfaces studied using infrared attenuated total reflection spectroscopy

Journal of the Electrochemical Society

Volumn 152, Issue 2, 2005, Pages

  Bermudez, V M ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; DIELECTRIC MATERIALS; HYDROLYSIS; LIGHT REFLECTION; OXIDATION; PH EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SILICON NITRIDE; SPECTROSCOPY; ULTRAHIGH VACUUM; ULTRATHIN FILMS; WATER ABSORPTION;

ATTENUATED TOTAL REFLECTION (ATR); ELECTRONIC MATERIALS; INTERNAL REFLECTION ELEMENT (IRE); LOW-PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);

SURFACE TREATMENT;

EID: 14744281245     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1851056     Document Type: Article

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