Growth and characterization of silicon nitride films on various underlying materials

Applied Physics A: Materials Science and Processing

Volumn 74, Issue 2, 2002, Pages 243-247

  Han, G C ^a   Luo, P ^a   Li, K B ^a   Liu, Z Y ^a   Wu, Y H ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ETCHING; FILM GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE ROUGHNESS; THERMAL EFFECTS;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION; UNDERLYING MATERIALS;

SILICON NITRIDE;

EID: 0036477613     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390100881     Document Type: Article

References (15)