Modification of silicon nitride tips with trichlorosilane Self-Assembled Monolayers (SAMs) for chemical force microscopy

Langmuir

Volumn 13, Issue 16, 1997, Pages 4323-4332

  Ito, Takashi ^a   Namba, Madoka ^a   Bühlmann, Philippe ^a   Umezawa, Yoshio ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; CHEMICAL MODIFICATION; COMPOSITION EFFECTS; CONTACT ANGLE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICA; MONOLAYERS; SILANES;

ALKENYLTRICHLOROSILANES; CHEMICAL FORCE MICROSCOPY; HYDROBORATION; SELF ASSEMBLED MONOLAYERS;

SILICON NITRIDE;

EID: 0031556148     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la9609783     Document Type: Article

References (48)

1. McGuire, G. E.; Swanson, M. L.; Parikh, N. R.; Simko, S.; Weiss, P. S.; Ferris, J. H.; Nemanich, R. J.; Chopra, D. R.; Chourasia, A. R. Anal. Chem. 1995, 67, 199R-220R.
2. Bottomley, L. A.; Coury, J. E.; First, P. N. Anal. Chem. 1996, 68, 185R-230R.
3. Louder, D. R.; Parkinson, B. A. Anal. Chem. 1995, 67, 297A-303A.
4. Frisbie, C. D.; Rozsnyai, L. F.; Noy, A.; Wrighton, M. S.; Lieber, C. M. Science 1994, 265, 2071-2074.
5. Noy, A.; Frisbie, C. D.; Rozsnyai, L. F.; Wrighton, M. S.; Lieber, C. M. J. Am. Chem. Soc. 1995, 117, 7943-7951.
6. Green, J.-B. D.; McDermott, M. T.; Porter, M. D.; Siperko, L. M. J. Phys. Chem. 1995, 99, 10960-10965.
7. Barrat, A.; Silberzan, P.; Bourdieu, L.; Chatenay, D. Europhys. Lett. 1992, 20, 633-638.
8. Nakagawa, T.; Ogawa, K.; Kurumizawa, T. J. Vac. Sci. Technol. B. 1994, 12, 2215-2218.
9. Nakagawa, T.; Ogawa, K.; Kurumizawa, T.; Ozaki, S. Jpn. J. Appl. Phys. 1993, 32, L294-L296.
10. Alley, R. L.; Komvopoulos, K.; Howe, R. T. J. Appl. Phys. 1994, 76, 5731-5737.
11. McGovern, M. E.; Kallury, K. M. R.; Thompson, M. Langmuir 1994, 10, 3607-3614 and references cited therein.
12. Ogbuji, L. U. T.; Jayne, D. T. J. Electrochem. Soc. 1993, 140, 759-766.
13. Wasserman, S. R.; Tao, Y.-T.; Whitesides, G. M.Langmuir 1989, 5, 1074-1087.
14. Heid, S.; Effenberger, F.; Bierbaum, K.; Grunze, M. Langmuir 1996, 12, 2118-2120.
15. Ohtake,T.; Mino, N.; Ogawa, K. Langmuir 1992, 8, 2081-2083.
16. Cleveland, J. P.; Manne, S.; Bocek, D.; Hansma, P. K. Rev. Sci. Instrum. 1993, 64, 403-405.
17. Grigg, D. A.; Russell, P. E.; Griffith, J. E. J. Vac. Sci. Technol. A 1992, 10, 680-683.
18. Burnham, N. A.; Colton, R. J. J. Vac. Sci. Technol. A 1889, 7, 2906-2913.
19. Good, R. J. In Contact Angle, Wettability and Adhesion; Mittal, K. L., Ed.; VSP: Utrecht, 1993; pp 3-36.
20. Thundat, T.; Zheng, X.-Y.; Chen, G. Y.; Sharp, S. L.; Warmack, R. J.; Schowalter, L. J. Appl. Phys. Lett. 1993, 63, 2150-2152.
21. Carson, G. A.; Granick, S. J. Mater. Res. 1990, 5, 1745-1751.
22. Nakagawa, T.; Ogawa, K.; Kurumizawa, T. Langmuir 1994, 10, 525-529.
23. Peanasky, J.; Schneider, H. M.; Granick, S.; Kessel, C. R. Langmuir 1995, 11, 953-962 and references cited therein.
24. 11
25. Williams, R. A.; Blanch, H. W. Biosens. Bioelectron. 1994, 9, 159-167.
26. 13
27. H2O for dodecyltrichlorosilane SAMs, which contain no olefin groups, before and after hydroboration were 110.3° ± 1.4 and 111.3° ± 0.6, respectively. The latter shows that the change in contact angle upon hydroboration observed for the UTS SAMs was not due to monolayer removal.
28. 13
29. With certain UTS-modified tips (3 of 16 examined tips), atomic images of mica were observed but no correlation between the size of the adhesion force and the resolution was observed.
30. Sinniah, S. K.; Steel, A. B.; Miller, C. J.; Reutt-Robey, J. E. J. Am. Chem. Soc. 1996, 118, 8925-8931.
31. Johnson, K. L.; Kendall, K.; Roberts, A. D. Proc. R. Soc. London A 1971, 324, 301-313.
32. Israelachvili, J. Intermolecular and Surface Forces; Academic Press: New York, 1992.
33. sl, can be obtained according to eq 3.
34. Wu, S. Polymer Interface and Adhesion; Marcel Dekker: New York, 1982; pp 178-181.
35. Kessel, C. R.; Granick, S. Langmuir 1991, 7, 532-538.
36. 36b respectively, (a) Christenson, H. K. Langmuir 1996, 12, 1404-1405. (b) van Nie, A. G. Solid State Technol. 1980, 32, 81-84.
37. 36b respectively, (a) Christenson, H. K. Langmuir 1996, 12, 1404-1405. (b) van Nie, A. G. Solid State Technol. 1980, 32, 81-84.
38. Fujii, M.; Sugisawa, S.; Fukada, K.; Kato, T.; Shirakawa, T.; Seimiya, T. Langmuir 1994, 10, 984-987.
39. Hoh, J. H.; Cleveland, J. P.; Prater, C. B.; Revel, J. P.; Hansma, P. K. J. Am. Chem. Soc. 1992, 114, 4917-4918.
40. 4 substrates completely covered with UTS SAMs (Table 1).
41. Rabinovich, Y. I.; Yoon, R.-H. Langmuir 1994, 10, 1903-1909.
42. Tsao, Y.; Evans, D. F.; Wennerstöm, H. Science 1993, 262, 547-550.
43. Parikh, A. N.; Allara, D. L.; Azouz, I. B.; Rondelez, F. J. Phys. Chem. 1994, 98, 7577-7590.
44. Peanasky, J.; Schneider, H. M.; Granick, S.; Kessel. C. R. Langmuir 1995, 11, 953-962.
45. Netzer, L.; Iscovici, R.; Sagiv, J. Thin Solid Films 1983, 100, 67-76.
46. Xiao, X.; Hu, J.; Charych, D. H.; Salmeron, M. Langmuir 1996, 12, 235-237.
47. Peach, S.; Polak, R. D.; Franck, C. Langmuir 1996, 12, 6053-6058.
48. Kurihara, K.; Abe, T.; Nakashima, N. Langmuir 1996, 12, 4053-4056.