In situ infrared spectroscopy on the wet chemical oxidation of hydrogen-terminated Si surfaces

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 6 A, 1998, Pages 3272-3277

  Sugita, Yoshihiro ^a   Watanabe, Satoru ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

HF; Hydrogen; IR; Oxidation; Si; SiO2; Solution

Indexed keywords

EID: 0001302447     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.3272     Document Type: Article

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