Hollow cathode discharges with gas flow: Numerical modelling for the effect on the sputtered atoms and the deposition flux

Plasma Sources Science and Technology

Volumn 14, Issue 1, 2005, Pages 191-200

  Bogaerts, Annemie ^a   Okhrimovskyy, Andriy ^a   Baguer, Neyda ^a   Gijbels, Renaat ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL FLUID DYNAMICS; ELECTRIC DISCHARGES; MASS SPECTROMETRY; MATHEMATICAL MODELS; MONTE CARLO METHODS; PLASMA DENSITY; PLASMA SOURCES; SPUTTER DEPOSITION;

FLUX EQUATIONS; HOLLOW CATHODE DISCHARGES (HCD); MICROWAVE PLASMAS; THERMALIZATION;

INDUCTIVELY COUPLED PLASMA;

EID: 14744269889     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/14/1/021     Document Type: Article

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