Impact of wide dynamic range plasma sources for advanced plasma processing

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 14-19

  Engemann, J ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Microwave; PACVD; Pulsed; Radio frequency (RE)

Indexed keywords

CATHODES; MICROELECTRONICS; MICROWAVES; MONOMERS;

PLASMA REACTORS;

PLASMAS;

COATING; PLASMA TREATMENT; SURFACE TREATMENT;

EID: 0038807807     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00046-X     Document Type: Article

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