Investigation of the rf and dc hollow cathode plasma-jet sputtering systems for the deposition of silicon thin films

Surface and Coatings Technology

Volumn 160, Issue 2-3, 2002, Pages 114-123

  Hubicka Z ^a,b   Pribil, G ^a   Soukup, R J ^a   Ianno, N J ^a  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

^b INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

A Si:H; Fourier transform infrared spectroscopy; Hollow cathode; Plasma jet; Silicon; Sputtering

Indexed keywords

DEPOSITION; HYDRIDES; LOW TEMPERATURE EFFECTS; PLASMA JETS; SILICON ALLOYS; SINGLE CRYSTALS;

PLASMA EXCITATION;

THIN FILMS;

FILM;

EID: 0037159162     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00389-4     Document Type: Article

References (31)

1. Vacuum physics and technology