Low pressure deposition of LixZnyO thin films by means of RF plasma jet system

Thin Solid Films

Volumn 447-448, Issue , 2004, Pages 656-662

  Hubicka Z ^a   Cada M ^a   Potucek Z ^a   Ptacek P ^a   Sichova H ^b   Malkova Z ^a   Jastrabik L ^a   Trunda, B ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Chemical composition; Emission spectroscopy; Photoluminescence; Plasma jet; RF hollow cathode; Thin films

Indexed keywords

ABSORPTION SPECTROSCOPY; COMPOSITION; CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; LITHIUM COMPOUNDS; PARAMETER ESTIMATION; PHOTOLUMINESCENCE; PLASMA JETS; PULSE MODULATION; SINTERING; SPUTTERING;

LOW PRESSURE DEPOSITION; REACTIVE SPUTTERING;

THIN FILMS;

EID: 1342283831     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.09.004     Document Type: Conference Paper

References (17)

1. Bárdoš L., Berg S., Baránková H. J. Vac. Sci. Technol. A. 11:1993;1486.
2. Bárdoš L., Baránková H. Surf. Coat. Technol. 46:2001;463.
3. Soukup L., Šícha M., Fendrych F., Hubička Z., Jastrabík L., Chvostová D., Šíchová H., Valvoda V., Tarasenko A., Studnička V., Wagner T., Novák M. Surf. Coat. Technol. 116-119:1999;321.
4. Hubička Z., Šícha M., Pajasova L., Soukup L., Jastrabík L., Chvostová D., Wagner T. Surf. Coat. Technol. 142:2001;681.
5. Joseph M., Tabata H., Kawai T. Appl. Phys. Lett. 74:1999;2534.
6. Wu Z.C., Zhang X.M., Liu J.M., Li Q.C., Chen X.Y., Yin J., Xu N. Liu ZG Ferroelectrics. 252:2001;477.
7. A. Onodera, N. Tamaki, Y. Kawamura, T. Sawada, H. Yamashita, Jpn. J. Appl. Phys., Part 1-Regular Papers Short Notes & Rev Papers 35 (9B) (1996) 5160.
8. G.A. Mohamed, E. Mohamed, A. Abu El-Fadl, Physica B 308 (2001) 949.
9. Ni H.Q., Lu Y.F., Liu Z.Y., Qiu H., Wang W.J., Ren Z.M., Chow S.K., Jie Y.X. Appl. Phys. Lett. 79:2001;812.
10. Hubička Z., Pribil G., Soukup R.J., Ianno N.J. Surf. Coat. Technol. 160:2002;114.
11. x thin films. Surf. Coat. Technol. 174-175:2003;632.
12. Tous J., Šícha M., Hubička Z., Soukup L., Jastrabík L., Čada M., Tichý M. Contrib. Plasm. Phys. 42:2002;119.
13. Coburn J.W., Chen M. J. Appl. Phys. 51:(6):1980;3134.
14. Donnelly V.M. J. Vac. Sci. Technol. A. 14:1996;1076.
15. Malyshev M.V., Donnelly V.M. J. Vac. Sci. Technol. A. 15:1997;550.
16. Connor W.T., Sawin H.H. Appl. Phys. Lett. 60:1992;557.
17. Marr G.V. Plasma Spectroscopy. 1968;Elsevier.