Incorporating the gas flow in a numerical model of rf discharges in methane

Journal of Applied Physics

Volumn 96, Issue 6, 2004, Pages 3070-3076

  Okhrimovskyy, A ^a   Bogaerts, A ^a   Gijbels, R ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY CONDITIONS; COMPUTATIONAL FLUID DYNAMICS; COMPUTER SIMULATION; DIAMOND LIKE CARBON FILMS; ELECTRODES; ELECTRON ENERGY LEVELS; METHANE; MONTE CARLO METHODS; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POISSON EQUATION; VELOCITY MEASUREMENT;

GAS FLOW MODELS; GAS VELOCITY; GROUNDED ELECTRODES;

GAS DYNAMICS;

EID: 4944260945     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1782951     Document Type: Article

References (23)

1. J. Robertson, Adv. Phys. 35, 317 (1986).
2. E. Gogolides, D. Mary, A. Rhaballi, and G. Turban, Jpn. J. Appl. Phys., Part 1 34, 261 (1995).
3. E. Dekempeneer, J. Smeets, J. Meneve, L. Eersels, and R. Jacobs, Thin Solid Films 241, 269 (1994).
4. N. Mutsukura, S. Inoue, and Y. Machi, J. Appl. Phys. 72, 43 (1992).
5. L. E. Kline, W. D. Partlow, and W. E. Bies, J. App l. Phys. 65, 70 (1988).
6. A. Von Keudell and W. Möller, J. Appl. Phys. 75, 7718 (1994).
7. C. Cavalotti, M. Masi and S. Carrá, J. Electrochem. Soc. 145, 4332 (1998).
8. K. Bera, B. Farouk, and Y. H. Lee, J. Electrochem. Soc. 146, 3264 (1998).
9. K. Nagayama, B. Farouk, and Y. H. Lee, IEEE Trans. Plasma Sci. 26, 125 (1998).
10. V. Ivanov, O. Proshina, T. Rakhimova, A. Rakhimov, D. Herrebout, and A. Bogaerts, J. Appl. Phys. 91, 6296 (2002).
11. G. J. Nienhuis, W. J. Goedheer, E. A. Hamers, W. G. Van Sark, and J. Bezemer, J. Appl. Phys. 82, 2060 (1997).
12. D. Herrebout, A. Bogaerts, M. Yan, R. Gijbels, W. Goedheer, and A. Vanhulsel, J. Appl. Phys. 90, 570 (2001).
13. D. Herrebout, A. Bogaerts, M. Yan, R. Gijbels, W. Goedheer, and A. Vanhulsel, J. Appl. Phys. 92, 2290 (2002).
14. G. Janssen, J. van Dijk, D. Benoy, M. Tas, K. Burm, W. J. Goedheer, J. van der Mullen, and D. C. Schram, Plasma Sources Sci. Technol. 8, 1 (1999).
15. D. F. Lymberopoulos, and D. J. Economou, IEEE Trans. Plasma Sci. 23, 573 (1995).
16. D. Bose, T. R. Govindan, and M. Meyyappan, J. Electrochem. Soc. 146, 2705 (1999).
17. Y. Tanaka and T. Sakuta, J. Phys. D 35, 468 (2002).
18. A. Bogaerts, A. Okhrimovskyy and R. Gijbels, J. Anal. At. Spectrom. 17, 1076 (2002).
19. Fluent 6.1 User guide (http://www.fluent.com).
20. D. L. Sharfetter and H. K. Gummel, IEEE Trans. Electron Devices 16, 64 (1976).
21. J. P. Boeuf, Phys. Rev. A 36, 2782 (1987).
22. M. C.M. van de Sanden, M. F.A.M. van Hest, A. de Graaf, A. H.M. Smets, K. G.Y. Letourneur, M. G.H. Boogaarts, and D. C. Schram, Diamond Relat. Mater. 8, 677 (1999).
23. H. Barankova and L. Bardos, Science 174, 63 (2003).