SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 188-189, Issue 1-3 SPEC.ISS., 2004, Pages 440-445

Properties of carbon nitride films produced by an inductively coupled plasma chemical vapor deposition

(4) Lee, D K a Kang, D H b Lee, H Y a Lee, J J a

a Seoul National University (South Korea)

b Korea Institute of Science and Technology (South Korea)

Author keywords

Carbon nitride; Inductively coupled plasma; Ion bombardment energy

Indexed keywords

ARGON; CARBON NITRIDE; CHEMICAL BONDS; CHEMICAL MODIFICATION; COMPOSITION; ELECTRIC POTENTIAL; HARDNESS; HYDROGEN; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE COATINGS; COMPOSITIONAL MODIFICATION; ION BOMBARDMENT ENERGY; STRUCTURAL MODIFICATIONS;

INORGANIC COATINGS;

COATING;

EID: 14644390897 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.08.197 Document Type: Article

Times cited : (4)

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