SCOPUS 정보 검색 플랫폼

Applied Surface Science

Volumn 191, Issue 1-4, 2002, Pages 273-279

Influence of substrate dc bias on chemical bonding, adhesion and roughness of carbon nitride films

(7) Li, Junjie a,b Zheng, W T a Jin, Zengsun a Lu, Xianyi a Gu, Guangrui a Mei, Xianxiu c Dong, Chuang c

a JILIN UNIVERSITY (China)

b YANBIAN UNIVERSITY (China)

c DALIAN UNIVERSITY OF TECHNOLOGY (China)

Author keywords

Adhesion; Carbon nitride; Chemical bonding; Roughness

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; BONDING; CARBON NITRIDE; GROWTH (MATERIALS); ION BOMBARDMENT; MAGNETRON SPUTTERING; MORPHOLOGY; RAMAN SPECTROSCOPY; SILICON; SUBSTRATES; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE FILMS;

AMORPHOUS FILMS;

EID: 0037123503 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(02)00221-0 Document Type: Article

Times cited : (37)

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