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Volumn 476, Issue 2, 2005, Pages 276-279
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Temperature dependence of InN film deposition by an RF plasma-assisted reactive ion beam sputtering deposition technique
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Author keywords
Ion bombardment; Nitrides; Sputtering; X ray diffraction
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Indexed keywords
DEPOSITION;
ION BEAMS;
ION BOMBARDMENT;
PLASMA APPLICATIONS;
RADIO WAVES;
SUBSTRATES;
THERMAL EFFECTS;
X RAY DIFFRACTION;
FILM DEPOSITION;
REACTIVE ION BEAM SPUTTERING;
SPUTTER CLEANING;
SPUTTER ETCHING;
THIN FILMS;
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EID: 13844310750
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2004.09.032 Document Type: Article |
Times cited : (9)
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References (16)
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