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Volumn 476, Issue 2, 2005, Pages 276-279

Temperature dependence of InN film deposition by an RF plasma-assisted reactive ion beam sputtering deposition technique

Author keywords

Ion bombardment; Nitrides; Sputtering; X ray diffraction

Indexed keywords

DEPOSITION; ION BEAMS; ION BOMBARDMENT; PLASMA APPLICATIONS; RADIO WAVES; SUBSTRATES; THERMAL EFFECTS; X RAY DIFFRACTION;

EID: 13844310750     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.09.032     Document Type: Article
Times cited : (9)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.