Deposition of an InN thin film by a r.f. plasma-assisted reactive ion-beam sputtering deposition (R-IBSD) technique

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 896-900

  Shinoda, Hiroyuki ^a   Mutsukura, Nobuki ^a  

^a TOKYO DENKI UNIVERSITY   (Japan)

Author keywords

Characterization; Ion assisted deposition; Nitrides; X ray diffraction

Indexed keywords

GAS FUEL PURIFICATION; ION BEAM ASSISTED DEPOSITION; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

SIGNAL INTENSITY;

INDIUM COMPOUNDS;

VAPOR DEPOSITION;

EID: 0036508390     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00679-3     Document Type: Article

References (17)