메뉴 건너뛰기




Volumn 193, Issue 1-3 SPEC. ISS., 2005, Pages 152-156

The effect of r.f. substrate bias on the properties of carbon nitride films produced by an inductively coupled plasma chemical vapor deposition

Author keywords

Carbon nitride; Inductively coupled plasma (ICP); Substrate self bias

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBON; CHEMICAL BONDS; HARDNESS; NITRIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 13844289195     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.134     Document Type: Article
Times cited : (11)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.