|
Volumn 193, Issue 1-3 SPEC. ISS., 2005, Pages 152-156
|
The effect of r.f. substrate bias on the properties of carbon nitride films produced by an inductively coupled plasma chemical vapor deposition
c
NONE
|
Author keywords
Carbon nitride; Inductively coupled plasma (ICP); Substrate self bias
|
Indexed keywords
AUGER ELECTRON SPECTROSCOPY;
CARBON;
CHEMICAL BONDS;
HARDNESS;
NITRIDES;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SUBSTRATES;
SURFACE ROUGHNESS;
X RAY PHOTOELECTRON SPECTROSCOPY;
BIAS VOLTAGE;
SUBSTRATE BIAS;
SUBSTRATE TEMPERATURE;
THIN FILMS;
CHEMICAL VAPOR DEPOSITION;
|
EID: 13844289195
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.08.134 Document Type: Article |
Times cited : (11)
|
References (20)
|