Characterization of CNx films prepared by reactive magnetron sputtering

Vacuum

Volumn 66, Issue 3-4, 2002, Pages 391-395

  Togashi, Yuki ^a   Hirohata, Yuko ^a   Hino, Tomoaki ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

Author keywords

Carbon nitride; FTIR; Hardness; Raman; Tetrahedral C N; Thin film; XPS

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAPHITE; MAGNETRON SPUTTERING; MICROHARDNESS; RAMAN SPECTROSCOPY; SUBSTRATES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ION BOMBARDMENT;

CARBON NITRIDE;

EID: 0037136145     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00160-4     Document Type: Article

References (10)