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Volumn 16, Issue 6, 2000, Pages 653-655
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Correlation between the relative sensitivity factors and the sputtering yields in glow-discharge mass spectrometry
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Author keywords
[No Author keywords available]
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Indexed keywords
MASS SPECTROMETRY;
GLOW DISCHARGE MASS SPECTROMETRY;
RELATIVE SENSITIVITY FACTOR;
SPUTTERING YIELDS;
GLOW DISCHARGES;
TRACE ELEMENT;
ACCURACY;
CHEMICAL ANALYSIS;
IONIZATION;
MASS SPECTROMETRY;
NOTE;
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EID: 0033936725
PISSN: 09106340
EISSN: None
Source Type: Journal
DOI: 10.2116/analsci.16.653 Document Type: Note |
Times cited : (10)
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References (18)
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