Lithographic patterning of a highly metallized polymer resist system and pyrolytic or plasma treatment to afford ferromagnetic ceramics

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3493-3496

  Clendenning, Scott B ^a   Manners, I ^a  

^a UNIVERSITY OF TORONTO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CATALYSIS; CERAMIC MATERIALS; FERRIMAGNETIC MATERIALS; MAGNETIC FIELDS; MAGNETIC PROPERTIES; POLYMERS; PYROLYSIS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ANALYSIS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

FERROMAGNETIC CERAMICS; LITHOGRAPHIC PATTERNING; METALLIZED POLYMER RESIST SYSTEMS; PLASMA TREATMENT;

PHOTOLITHOGRAPHY;

EID: 13244279793     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1821507     Document Type: Conference Paper

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