Magnetic Ceramic Films from a Metallopolymer Resist Using Reactive Ion Etching in a Secondary Magnetic Field

Advanced Materials

Volumn 16, Issue 4, 2004, Pages 291-296

  Clendenning, Scott B ^a   Han, Sijin ^a   Coombs, Neil ^a   Paquet, Chantal ^a   Rayat, Mandeep S ^b   Grozea, Dan ^a   Brodersen, Peter M ^a   Sodhi, Rana N S ^a   Yip, Christopher M ^b   Lu, Zheng Hong ^a   Manners, Ian ^a  

^a UNIVERSITY OF TORONTO   (Canada)

^b UNIVERSITY OF TORONTO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BINDING ENERGY; CALIBRATION; CERAMIC MATERIALS; ELLIPSOMETRY; ETCHING; MAGNETIC FIELDS; MICELLES; MOLECULAR WEIGHT; POLYMERS; PYROLYSIS; RING OPENING POLYMERIZATION; SCANNING ELECTRON MICROSCOPY; SPIN COATING; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ION ETCHING; MAGNETIC CERAMIC FILMS; METALLOPOLYMER RESIST;

MAGNETIC FILMS;

EID: 12144290300     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200306262     Document Type: Article

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