Two-step modified NERIME process using combined focused ion beam lithography and plasma etching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5220, Issue , 2003, Pages 82-92

  Arshak, Khalil ^a   Mihov, Miroslav ^a   Arshak, Arous ^a   McDonagh, Declan ^b   Sutton, David ^a   Newcomb, Simon B ^a  

^a UNIVERSITY OF LIMERICK   (Ireland)

^b Integrated Device Technology Inc   (United States)

Author keywords

Focused ion beam; Nanolithography; NERIME process; Plasma etching

Indexed keywords

ANISOTROPY; INTEGRATED CIRCUIT MANUFACTURE; NANOTECHNOLOGY; PHOTORESISTS; PLASMA ETCHING;

FOCUSED ION BEAMS (FIB); NEGATIVE RESIST IMAGE BY DRY ETCHING (NERIME);

ION BEAM LITHOGRAPHY;

EID: 1242263522     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.503510     Document Type: Conference Paper

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