Diffusion limitations in high-resolution lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 491-499

  Bauch, Lothar ^a   Jagdhold, Ulrich A ^a   Boettcher, Monica ^a   Mehliss, Georg G ^a  

^a Frankfurt (Oder) GmbH Dresden Ger   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFUSION; OPTICAL RESOLVING POWER; PHOTORESISTS; THICKNESS MEASUREMENT; THIN FILMS;

DIAZONAPHTHOQUINONE; PRIME-PROCESS;

PHOTOLITHOGRAPHY;

EID: 0029767226     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241847     Document Type: Conference Paper

References (8)