Direct write patterning of titanium films using focused ion beam implantation and plasma etching

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 63-66

  Zachariasse, J M Frank ^a,b   Walker, John F ^c  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b EUROPEAN SPACE AGENCY   (Netherlands)

^c Fei europe   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

GALLIUM; ION BEAM LITHOGRAPHY; ION IMPLANTATION; METALLIC FILMS; TITANIUM;

DIRECT WRITE PATTERNING; FOCUSED ION BEAM IMPLANTATION; GALLIUM ION; TITANIUM FILM; TITANIUM WIRE;

PLASMA ETCHING;

EID: 0031073204     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00148-7     Document Type: Article

References (10)

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