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Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 571-577

Development of advanced silylation process for 157-nm lithography

(4) Satou, Isao a Watanabe, Manabu a Watanabe, Hiroyuki a Itani, Toshiro a

a SLET Inc (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEGRADATION; FABRICATION; OPTIMIZATION; PHOTOLITHOGRAPHY;

SILYLATION PROCESSES;

IMAGING TECHNIQUES;

EID: 0035450886 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/S0167-9317(01)00502-0 Document Type: Article

Times cited : (5)

References (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.