Negative resist image by dry etching: A novel surface imaging resist scheme

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 130-139

  Arshak, K ^a   Mihov, M ^a   Sutton, D ^a   Arshak, A ^a   Newcomb, S B ^a  

^a UNIVERSITY OF LIMERICK   (Ireland)

Author keywords

Ion beam exposure; Liquid phase silylation; PRIME process; Top surface imaging

Indexed keywords

DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; ION BEAMS; POSITIVE IONS;

NEGATIVE RESIST IMAGES;

IMAGE PROCESSING;

EID: 0038021006     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00169-2     Document Type: Conference Paper

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