Study of spin coating properties of SU-8 thick-layer photoresist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue I, 2001, Pages 494-501

  Chen, R H ^a   Cheng, C M ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Spin coating; SU 8; Thick layer resist; Thickness uniformity

Indexed keywords

RHEOMETERS; SPIN COATING; THICK FILMS; VISCOSITY;

THICK FILM RESISTS;

PHOTORESISTS;

EID: 0034768959     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436881     Document Type: Conference Paper

References (7)

1. SU-8: A low-cost negative resist for MEMS
2. High- aspect- ratio, ultrathick, negative- tone near-UV photoresist and its applications for MEMS
3. Flow of a viscous liquid on a rotating disk
4. On the flow of a non-Newtonian liquid on a rotating disk
5. Characteristics of resist films produced by spinning
6. Mechanical characterization of a new high- aspect- ratio near UV- photoresist
7. Modelling effects of surface tension on surface topology in spin coatings for integrated optics and micromechanics