Micropatterning of metal nanoparticles via UV photolithography

Advanced Materials

Volumn 15, Issue 17, 2003, Pages 1449-1452

  Horiuchi, Shin ^a   Fujita, Takashi ^a   Hayakawa, Teruaki ^a   Nakao, Yukimichi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON DIFFRACTION; ELLIPSOMETRY; MASKS; PALLADIUM COMPOUNDS; PARTICLE SIZE ANALYSIS; PHOTOLITHOGRAPHY; POLYMETHYL METHACRYLATES; SILICON WAFERS; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

FUNCTIONAL NANOSTRUCTURED MATERIALS; METAL NANOPARTICLES; MICROPATTERNING; ULTRAVIOLET PHOTOLITHOGRAPHY;

NANOTUBES;

EID: 0141518453     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200305270     Document Type: Article

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