-
2
-
-
0001844227
-
-
Hartney, M.; Hess, D.; Soane, D. J. Vac. Sci. Technol. B 1989, 7, 1-13.
-
(1989)
J. Vac. Sci. Technol. B
, vol.7
, pp. 1-13
-
-
Hartney, M.1
Hess, D.2
Soane, D.3
-
3
-
-
0000356191
-
-
Petri, R.; Brault, P.; Vatel, O.; Henry, D.; Andre, E.; Dumas, P.; Salvan, F. J. Appl. Phys. 1994, 75 (11), 7498-7506.
-
(1994)
J. Appl. Phys.
, vol.75
, Issue.11
, pp. 7498-7506
-
-
Petri, R.1
Brault, P.2
Vatel, O.3
Henry, D.4
Andre, E.5
Dumas, P.6
Salvan, F.7
-
4
-
-
0021819216
-
-
Chou, N. J.; Tang, C. H.; Paraszcazk, J.; Babich, E. Appl. Phys. Lett. 1985, 46, 31-33.
-
(1985)
Appl. Phys. Lett.
, vol.46
, pp. 31-33
-
-
Chou, N.J.1
Tang, C.H.2
Paraszcazk, J.3
Babich, E.4
-
5
-
-
0011495513
-
-
Anaheim, CA; Turner, S. R., Bowden, M. J., Eds.; ACS Symposium Series; American Chemical Society: Washington, D.C.
-
Gokan, H.; Saotome, Y.; Saigo, K.; Watanabe, F.; Ohnishi, Y. In Polymers for High Technology, Electronics, and Photonics, Anaheim, CA; Turner, S. R., Bowden, M. J., Eds.; ACS Symposium Series; American Chemical Society: Washington, D.C., 1986; pp 358-368.
-
(1986)
Polymers for High Technology, Electronics, and Photonics
, pp. 358-368
-
-
Gokan, H.1
Saotome, Y.2
Saigo, K.3
Watanabe, F.4
Ohnishi, Y.5
-
6
-
-
0021937189
-
-
SPIE: Bellingham, WA
-
Ohnishi, Y.; Suzuki, M.; Saigo, K.; Saotome, Y.; Gokan, H. Advances in Resist Technology and Processing II; SPIE Vol. 539; SPIE: Bellingham, WA, 1985; p 62-69.
-
(1985)
Advances in Resist Technology and Processing II
, vol.539
, pp. 62-69
-
-
Ohnishi, Y.1
Suzuki, M.2
Saigo, K.3
Saotome, Y.4
Gokan, H.5
-
7
-
-
0021630511
-
-
SPIE: Bellingham, WA
-
Reichmanis, E.; Smolinsky, G. Advances in Resist Technology and Processing, SPIE Vol. 469; SPIE: Bellingham, WA, 1984; p 38-43.
-
(1984)
Advances in Resist Technology and Processing
, vol.469
, pp. 38-43
-
-
Reichmanis, E.1
Smolinsky, G.2
-
9
-
-
84984134262
-
-
SPIE: Bellingham, WA
-
Jurgensen, C. W.; Shugard, A.; Dudash, N.; Reichmanis, E.; Vasile, M. J. SPIE, Advances in Resist Technology and Processing V; SPIE Vol. 920; SPIE: Bellingham, WA, 1988; pp 253-259.
-
(1988)
SPIE, Advances in Resist Technology and Processing v
, vol.920
, pp. 253-259
-
-
Jurgensen, C.W.1
Shugard, A.2
Dudash, N.3
Reichmanis, E.4
Vasile, M.J.5
-
11
-
-
0000192110
-
-
Durandet, A.; Joubert, O.; Pelletier, J.; Pichot, M. J. Appl. Phys. 1990, 67 (8), 3862-3868.
-
(1990)
J. Appl. Phys.
, vol.67
, Issue.8
, pp. 3862-3868
-
-
Durandet, A.1
Joubert, O.2
Pelletier, J.3
Pichot, M.4
-
12
-
-
0007127844
-
-
Joubert, O.; Fiori, C.; Oberlin, J. C.; Paniez, P.; Pelletier, J.; Pons, M.; Vachette, T.; Weill, A. J. Appl. Phys. 1991, 69 (3), 1697-1702.
-
(1991)
J. Appl. Phys.
, vol.69
, Issue.3
, pp. 1697-1702
-
-
Joubert, O.1
Fiori, C.2
Oberlin, J.C.3
Paniez, P.4
Pelletier, J.5
Pons, M.6
Vachette, T.7
Weill, A.8
-
13
-
-
0026493009
-
-
SPIE: Bellingham, WA
-
Joubert, O.; Claude, R.; Pons, M.; Weill, A.; Paniez, P. Advances in Resist Technology and Processing IX; SPIE Vol. 1672; SPIE: Bellingham, WA, 1992; pp 561-572.
-
(1992)
Advances in Resist Technology and Processing IX
, vol.1672
, pp. 561-572
-
-
Joubert, O.1
Claude, R.2
Pons, M.3
Weill, A.4
Paniez, P.5
-
14
-
-
0011495513
-
-
Anaheim, CA; Turner, S. R., Bowden, M. J. Eds.; ACS Symposium Series; American Chemical Society: Washington, D.C.
-
Gokan, H.; Saotome, Y.; Saigo, K.; Watanabe, F.; Ohnishi, Y. In Polymers for High Technology, Electronics, and Photonics, Anaheim, CA; Turner, S. R., Bowden, M. J. Eds.; ACS Symposium Series; American Chemical Society: Washington, D.C., 1987; pp 358-368.
-
(1987)
Polymers for High Technology, Electronics, and Photonics
, pp. 358-368
-
-
Gokan, H.1
Saotome, Y.2
Saigo, K.3
Watanabe, F.4
Ohnishi, Y.5
-
15
-
-
84957522931
-
-
Bobbio, S. M.; Jones, S. K.; Tessier, T. G.; Dudley, B. W.; Cohen, B.; Russell, F. J.; Morosoft, A. SPIE 1989, 1185, 24-33.
-
(1989)
SPIE
, vol.1185
, pp. 24-33
-
-
Bobbio, S.M.1
Jones, S.K.2
Tessier, T.G.3
Dudley, B.W.4
Cohen, B.5
Russell, F.J.6
Morosoft, A.7
-
16
-
-
36448999318
-
-
Joubert, O.; Paniez, P.; Pelletier, J.; Pons, M. Appl. Phys. Lett. 1991, 58 (9), 959-961.
-
(1991)
Appl. Phys. Lett.
, vol.58
, Issue.9
, pp. 959-961
-
-
Joubert, O.1
Paniez, P.2
Pelletier, J.3
Pons, M.4
-
17
-
-
0025751799
-
-
SPIE
-
Paniez, P. J.; Joubert, O. P.; Pons, M. J.; Oberlin, J.-C.; Weill, A. P. Advances in Resist Technology and Processing; SPIE Vol. 1466; SPIE: 1991; pp 583-591.
-
(1991)
Advances in Resist Technology and Processing
, vol.1466
, pp. 583-591
-
-
Paniez, P.J.1
Joubert, O.P.2
Pons, M.J.3
Oberlin, J.-C.4
Weill, A.P.5
-
18
-
-
0024017068
-
-
The monomer was synthesized following a modified literature procedure (Kawakami, Y.; Hisada, H.; Yamashita, U. J. Polym. Sci., Polym. Chem. 1988, 26, 1307).
-
(1988)
J. Polym. Sci. Polym. Chem.
, vol.26
, pp. 1307
-
-
Kawakami, Y.1
Hisada, H.2
Yamashita, U.3
-
19
-
-
0030107019
-
-
Hawker, C. J.; Elce, E.; Dao, J.; Volksen, W.; Russell, T. P.; Barclay, G. Macromolecules 1996, 29, 2686-2688.
-
(1996)
Macromolecules
, vol.29
, pp. 2686-2688
-
-
Hawker, C.J.1
Elce, E.2
Dao, J.3
Volksen, W.4
Russell, T.P.5
Barclay, G.6
-
20
-
-
0000334098
-
-
Avgeropolous, A.; Chan, V. Z. H.; Lee, V.; Ngo, D.; Miller, R. D.; Hadjichristidis, N.; Thomas, E. L. Chem. Mater. 1998, 10, 2109-2115.
-
(1998)
Chem. Mater.
, vol.10
, pp. 2109-2115
-
-
Avgeropolous, A.1
Chan, V.Z.H.2
Lee, V.3
Ngo, D.4
Miller, R.D.5
Hadjichristidis, N.6
Thomas, E.L.7
-
22
-
-
79961232814
-
-
Version 4.10.01; Digital Instruments: Santa Barbara, CA
-
Command Reference Manual, Version 4.10.01; Digital Instruments: Santa Barbara, CA 1996; p 12.67.
-
(1996)
, pp. 1267
-
-
Reference Manual, C.1
-
24
-
-
0000993888
-
-
Arkles, B. Chemtech 1977, 7, 766-778.
-
(1977)
Chemtech
, vol.7
, pp. 766-778
-
-
Arkles, B.1
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